Picture of Vistec 5200 ES 100 kV Electron Beam Lithography Tool
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Group:
29_Microfabrication and Exploratory Nanotechnology
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Vistec 5200 ES 100 kV - The electron-beam lithography system is designed for high resolution fabrication and placement of patterns written directly on substrates up to 200 mm. The system is also very capable of writing optical masks for contact and projection lithography. It allows exposure of structures with minimum dimensions below 10 nm, on Si and other substrates (glass, SiO2) with High current density Thermal Field Emission gun for operation at 50 and 100 kV.

Tool name:
Vistec 5200 ES 100 kV Electron Beam Lithography Tool
Area/room:
01.01. Cleanroom
Manufacturer:
Vistec
Model:
5200 ES 100 kV
Booking type:
Optional

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Licensed Users

Micro and Nanofabrication
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