Picture of Wet bench 1 - Resist Strip Process
Current status:
AVAILABLE
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1st Responsible:
2nd Responsible:
Group:
29_Microfabrication and Exploratory Nanotechnology
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This tool is specfc for resist strip processes. Acids and bases are not to be used in wet bench 1.

Wet bench 1, model - resist strip has the following characteristics:

  • Dimesnsions: 2000 x 1000 x 2500 mm3;
  • Sliding Sash;
  • Interior Illimunination;
  • Cupboards with 3 doors at the bottom;
  • Work surface with aspiration;
  • Individual aspiration in each bath;
  • General aspiration on the rear panel an upper;
  • Recirculation systems in the baths through electro-valve and button;
  • 2 sockets (220 V);
  • Vacuum outlet for tweezers;
  • 2 nitrogen guns (right and left side);
  • 1 DI-water sprayer (right side);
  • 2 drains (right and left side): 300 x 150 mm2:
    • the right side drain is for hazardous aqueous residues and connects to in-house acid tank;
    • teh leftside drain if for halogenated organic residues and connects to a jerrican located in the grey area
  • Bath 1 - 250 x 200 x 100 mm3;
  • Bath 2 and 3 - 250 x 200 x 100 mmwith lid, recirculation and filter;
  • Ultrasounds.
Tool name:
Wet bench 1 - Resist Strip Process
Area/room:
01.01. Cleanroom
Manufacturer:
Quimipol
Model:
Bench
Booking type:
Optional

Instructors

Licensed Users

Micro and Nanofabrication
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