Picture of Wet bench 3 - HF / Etching Process
Current status:
AVAILABLE
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1st Responsible:
2nd Responsible:
Group:
29_Microfabrication and Exploratory Nanotechnology
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This tool is specific for wet etching processes. Organic solvents are not to be used in wet bench 3.

Wet bench 12 model - has the following characteristics:

  • Dimesnsions: 2000 x 1000 x 2500 mm3;
  • Sliding Sash;
  • Interior Illimunination;
  • Cupboards with 3 doors at the bottom;
  • Work surface with aspiration
  • Individual aspiration in each bath;
  • General aspiration on the rear panel an upper;
  • Recirculation systems in the baths through electro-valve and button;
  • 2 sockets (220 V);
  • Vacuum outlet for tweezers;
  • 2 nitrogen guns (right and left side);
  • 1 DI-water sprayer (right side);
  • 1 drain (right side): 300 x 150 mm2:
    • for diluted acids
    • 1 drain per bath, 5 baths
Tool name:
Wet bench 3 - HF / Etching Process
Area/room:
01.01. Cleanroom
Manufacturer:
Quimipol
Model:
Bench
Booking type:
Optional

Instructors

Licensed Users

Micro and Nanofabrication
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