Picture of Kenosistec - UHV multitarget confocal sputtering tool
Current status:
AVAILABLE
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2nd Responsible:
Group:
29_Microfabrication and Exploratory Nanotechnology
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Kenosystec - A multi-target UHV sputtering system consisting of a deposition chamber with 11 2” diameter magnetrons in confocal geometry for the co-deposition of materials, optimized wafers of up to 200m in diameter

Tool name:
Kenosistec - UHV multitarget confocal sputtering tool
Area/room:
01.01. Cleanroom
Manufacturer:
Kenosistec
Model:
Sputtering
Booking type:
Optional

Instructors

Licensed Users

Micro and Nanofabrication
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