Picture of SPTS PECVD - SiO2, SINx,  a:Si
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AVAILABLE
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1st Responsible:
2nd Responsible:
Group:
29_Microfabrication and Exploratory Nanotechnology
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SPTS MPX CVD - Tool dedicated to silicon oxide and silicon nitride deposition by Plasma Enhanced Chemical Vapour Deposition (PECVD). It has a single wafer processing chamber and dual high/low frequency RF options. It uses a plasma to enhance the chemical reaction rates of the precursors, which allows deposition of thin films at lower temperatures (typically<350°C) than conventional CVD systems.

Tool name:
SPTS PECVD - SiO2, SINx, a:Si
Area/room:
01.01. Cleanroom
Manufacturer:
SPTS
Model:
CVD MPX
Booking type:
Compulsory

Instructors

Licensed Users

Micro and Nanofabrication
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